Investigation and characterization of III-nitrides and alloys - thin films, nanostructures and quantum structures. Characterization of the materials is done by using advanced X-ray diffraction characterization techniques, atomic force microscopy, Raman scattering analysis, time resolved and temperature dependent photoluminescence (PL) for measuring optical properties and conduct experiments for measuring electrical properties and basic theory for understanding in detail physical properties.
Working in Nanofabrication, and nanolithography particularly by e-beam lithography. E-beam lithography with different resist materials coupled with various etching methods are used to achieve nanoscale patterning by cleanroom processing. Moreover, working on the fabrication and the characterization of nano-slotted Si waveguides for different applications like sensor.
M.S. in Electrical and Electronics Engineering from University of Kassel, Germany, 2010-2012.
B-Tech Degree in Electronics Engineering from Kerala University, India 2004-2008.
Student Research Assistant in Computational Electronics and Photonics Department in University of Kassel, Germany, 2011-2012.
Design and Development Engineer in Motorola Pvt. Ltd Bangalore, India, 2008-2009.
Scientific and Professional Membership
Institute of electrical and Electronics Engineers (IEEE)
Materials Science Society (MRS)
Research Interests Keywords
SemiconductorsNanomaterialsOptical SpectroscopyElectromagnetics and optoelectronicsSpectroscopic and Microscopic imaging systemNanofabrication